Silicon Carbide High Temperature Oxidation Furnace

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This is a specialised equipment for the high temperature oxidation process of Silicon Carbide (SiC) discs. This equipment is capable of oxidising SiC materials at high temperatures to meet specific process requirements. In addition to the high temperature oxidation of SiC wafers, the machine can also be used for the oxidation of conventional silicon wafers.

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Silicon Carbide High Temperature Oxidation Furnace

Silicon Carbide High Temperature Furnace

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Email:13077017815@163.com

chitanauto@163.com

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Room 201-2, 2nd Floor, Jixiang Complex Building, Liyu Industrial Park, Tianyuan District, Zhuzhou City, Hunan Province
Mr. Gong +86 13975355803

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