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One-to-Two High-Temperature Vacuum Purification Furnace
One-to-Two High-Temperature Vacuum Purification Furnace
One-to-Two High-Temperature Vacuum Purification Furnace
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  • One-to-Two High-Temperature Vacuum Purification Furnace
  • One-to-Two High-Temperature Vacuum Purification Furnace
  • One-to-Two High-Temperature Vacuum Purification Furnace

One-to-Two High-Temperature Vacuum Purification Furnace


The one-to-two high-temperature vacuum purification furnace (1 power supply, 2 furnace bodies) is a new product developed by our company based on advanced domestic and international material processes and user feedback. It is designed for the high-temperature sintering of carbon-based materials such as silicon-carbon, porous carbon, mesoporous carbon, and foamed carbon, and is continuously improved and upgraded. It boasts advantages of greater stability, energy efficiency, and intelligence. The high-temperature vacuum purification furnace is also suitable for the heat treatment of some semiconductor materials such as silicon carbide, gallium nitride, boron carbide, high-purity silicon, and special metals such as high-temperature alloys and high-purity metals like titanium, nickel, and molybdenum. The core processes are high-temperature vacuum, atmosphere purification, degassing, impurity removal, and sintering densification.

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One-to-Two High-Temperature Vacuum Purification Furnace


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One-to-Two High-Temperature Vacuum Purification Furnace

The one-to-two high-temperature vacuum purification furnace (1 power supply, 2 furnace bodies) is a new product developed by our company based on advanced domestic and international material processes and user feedback. It is designed for the high-temperature sintering of carbon-based materials such as silicon-carbon, porous carbon, mesoporous carbon, and foamed carbon, and is continuously improved and upgraded. It boasts advantages of greater stability, energy efficiency, and intelligence. The high-temperature vacuum purification furnace is also suitable for the heat treatment of some semiconductor materials such as silicon carbide, gallium nitride, boron carbide, high-purity silicon, and special metals such as high-temperature alloys and high-purity metals like titanium, nickel, and molybdenum. The core processes are high-temperature vacuum, atmosphere purification, degassing, impurity removal, and sintering densification.


2800℃ One-to-Two Graphitization Furnace

The One-to-Two Graphitization Furnace is a high-temperature graphitization furnace mainly used for the graphitization of graphene oxide, PI thermal conductive films, sintering and graphitization of carbon fiber ropes and filaments, sintering and graphitization of carbon materials, graphitization of anode materials, and other carbon materials, carbon-carbon and carbon-ceramic composite materials, as well as high-temperature sintering and graphitization of industrial ceramics and powder metallurgy materials.


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