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2800℃ One-to-Two Graphitization Furnace

The One-to-Two Graphitization Furnace is a high-temperature graphitization furnace mainly used for the graphitization of graphene oxide, PI thermal conductive films, sintering and graphitization of carbon fiber ropes and filaments, sintering and graphitization of carbon materials, graphitization of anode materials, and other carbon materials, carbon-carbon and carbon-ceramic composite materials, as well as high-temperature sintering and graphitization of industrial ceramics and powder metallurgy materials.


Bottom-Discharge Graphitization Furnace

The bottom-discharge graphitization furnace is a new generation of bottom-discharge graphitization furnace developed from the top-opening graphitization furnace. It is used for the carbonization and graphitization of carbon materials; the shaping and graphitization of carbon fiber filaments; and other materials that can be sintered in a carbon environment. The bottom-discharge graphitization furnace is suitable for processing and graphitizing large products, greatly improving the convenience of feeding and discharging. It is suitable for high-temperature treatment (sintering, graphitization, purification, etc.) of materials under vacuum or atmosphere protection.


Ultra High Temperature Graphitising Furnace

It is applied to high-temperature physical purification and high-temperature graphitization of artificial graphite, natural graphite, battery anode materials, graphene, artificial graphite thermal conductivity touch (PI), and ceramic composite materials.


Horizontal Graphitization Furnace

It is applied to high-temperature physical purification and high-temperature graphitization of artificial graphite, natural graphite, battery anode materials, graphene, artificial graphite thermal conductivity touch (PI), and ceramic composite materials.


3200℃ One-to-Two Graphitization Furnace

It is applied to high-temperature physical purification and high-temperature graphitization of artificial graphite, natural graphite, battery anode materials, graphene, artificial graphite thermal conductivity touch (PI), and ceramic composite materials.


PI Film Graphitising Furnace

It is applied to high-temperature physical purification and high-temperature graphitization of artificial graphite, natural graphite, battery anode materials, graphene, artificial graphite thermal conductivity touch (PI), and ceramic composite materials.


Vertical Graphitization Furnace

It is applied to high-temperature physical purification and high-temperature graphitization of artificial graphite, natural graphite, battery anode materials, graphene, artificial graphite thermal conductivity touch (PI), and ceramic composite materials.


Experimental Graphitization Furnace

It is applied to high temperature physical purification, high temperature graphitising and high temperature sintering treatment of artificial graphite, natural graphite, carbon nanotubes, carbon materials, ceramic composites, etc.


Vacuum Graphitization Furnace

It is applied to high temperature physical purification, high temperature graphitising and high temperature sintering treatment of artificial graphite, natural graphite, carbon nanotubes, carbon materials, ceramic composites, etc.


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