High-temperature Graphitization Furnace Technology Ushered in a New Breakthrough, Helping New Energy and Semiconductor Industry Upgrade

Release time:

2025-07-31

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Abstract

With the rapid development of new energy vehicles, energy storage batteries and semiconductor industry, the demand for high-performance carbon materials (such as artificial graphite, carbon fibers, carbon/carbon composites) has surged, driving the iterative upgrade of high-temperature graphitization furnace technology. Recently, a number of domestic equipment manufacturers and materials companies jointly released a new generation of high-temperature graphitization furnace solutions, energy efficiency, temperature control accuracy and automation to achieve a major breakthrough, is expected to further reduce production costs, and promote the industry's high-quality development.

1.Technical innovation: energy saving and high efficiency become the core trend

The traditional graphitization furnace generally has high energy consumption (single furnace power consumption can be tens of thousands of degrees), temperature uniformity is not enough and other problems. The latest research and development of “multi-temperature zone cooperative heating” and “inert atmosphere recycling” technology, can reduce energy consumption by 20% ~ 30%, and at the same time through the AI intelligent temperature control system to achieve ± 5 ° C precision control, significantly improve the consistency of the degree of graphitization of materials. The graphitization degree consistency of the material is significantly improved.

2. Application Expansion: from lithium anode to new semiconductor materials

New Energy Field:

Artificial graphite anode material is the key raw material for power battery, and the upgrade of high-temperature graphitization furnace directly contributes to the development of fast-charging anode (such as silicon-carbon composite material).

Some companies have tried to apply continuous graphitization furnace in mass production, replacing the traditional intermittent production, efficiency improvement of more than 40%.

Semiconductor and aerospace materials:

High-purity graphite parts (such as wafer growth crucibles) and silicon carbide (SiC) substrate graphitization treatment demand growth, driving the development of ultra-high-temperature (3000 ° C +) furnace type of customization.

Further expansion of carbon/carbon composites in rocket nozzles and high-temperature fixtures.

3.Industry Challenges and Future Prospects

Despite significant technological progress, the industry still faces two major bottlenecks:

High cost of equipment: the price of a single high-end graphitization furnace can reach tens of millions of dollars, and small and medium-sized enterprises (SMEs) are under great pressure to invest.

Upgrade of environmental protection requirements: graphitization process requires more stringent solutions for carbon emissions and dust treatment.

High-temperature graphitization furnace as the core equipment of the carbon materials industry, its technological upgrading will continue to empower new energy, semiconductor and other strategic industries. With policy support and increased investment in R & D, China is expected to occupy a more dominant position in the field of global high-end carbon materials processing equipment.

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